Effect of tungsten sputtering current on structural and morphological properties of WC thin films

Main Article Content

Attapol Choeysuppaket

Abstract




Nanostructured tungsten carbide (WC) thin films were deposited on Si wafer by DC magnetron co- sputtering using tungsten and graphite targets. The effect of tungsten sputtering current on the structural and morphology of thin film was investigated by X-ray diffraction (XRD), Raman scattering spectroscopy and field emission scanning electron microscopy (FESEM), respectively. The XRD results showed that all film formed nanocrystalline WC phase with preferred orientation along (100) plane. The crystallize size of WC was increase with increasing the tungsten sputtering current. In additional, WC1-x phase were observed when increasing the tungsten sputtering from 0.40 to 0.60 A.




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How to Cite
Choeysuppaket, A. (2018). Effect of tungsten sputtering current on structural and morphological properties of WC thin films. SNRU Journal of Science and Technology, 10(1), 82-86. Retrieved from https://www.tci-thaijo.org/index.php/snru_journal/article/view/108114
Section
Research Article